Which is more advanced, etching machine or photolithography machine

From the perspective of working principle, lithography machines and etching machines. If manufacturing chips is compared to building a house, then the function of a lithography machine is to mark the structure of the house on the ground. Etching machine is a device that only appears after photolithography is completed, and it is also one of the most important devices after photolithography is completed. The main function of an etching machine is to build the infrastructure according to the lines already marked by the lithography machine, removing unnecessary areas and leaving only the lines marked during the lithography process.

2. Structural comparison: From a structural perspective, photolithography machines and etching machines. The main core technology of a lithography machine is the light source and optical path, which consist of four main components: the light source, exposure, detection, and other high-precision mechanical components. In contrast, the structure of an etching machine is much simpler, mainly consisting of a plasma RF source, a reaction chamber, and a vacuum gas path.

The job responsibilities of an etching machine

       Etching machine It is mainly composed of a plasma RF source, a reaction chamber, and a vacuum gas path. Its main function is to use an etching machine to remove unwanted areas after the fine patterns on the mask are printed onto the silicon wafer through light exposure, leaving only the marked lines, patterns, etc. during the photolithography process.

Therefore, in the chip manufacturing process, after the lithography machine completes its own work, it needs to be further processed by the etching machine to form a complete chip manufacturing process chain. It can be said that the etching machine is an essential equipment after photolithography and an important link in assisting the operation of the lithography machine.